Metrology tool fleet management: applying FMP tool matching and monitoring concepts to an overlay fleet

Jennifer Morningstar; Eric Solecky; Chas Archie; Bill Banke

doi:10.1117/12.655578

24 March 2006 Metrology tool fleet management: applying FMP tool matching and monitoring concepts to an overlay fleet

Jennifer Morningstar, Eric Solecky, Chas Archie, Bill Banke

Proceedings Volume 6152, Metrology, Inspection, and Process Control for Microlithography XX; 615212 (2006) https://doi.org/10.1117/12.655578
Event: SPIE 31st International Symposium on Advanced Lithography, 2006, San Jose, California, United States

Abstract

Overlay tool matching and accuracy issues are quickly reaching a comparable complexity to that of critical dimensional metrology. While both issues warrant serious investigation, this paper deals with the matching issues associated with overlay tools. Overlay tools need to run and measure as if they are a single tool - they need to act as one. In this paper a matching methodology is used to assess a set of overlay tools in a multiple of overlay applications. The methodology proposed in a prior² SPIE paper is applied here to a fleet of two generations of overlay tools to detect measurement problems not seen with convention Statistical Process Control techniques. Four studies were used to examine the benefits of this matching methodology for this fleet of overlay tools. The first study was a matching assessment study. The second study was a hardware comparison between generations of tools. The third study was a measurement strategy comparison. The final study was a long term matching exercise where one example of a traditional long term monitoring strategy was compared to a new long term monitoring strategy. It is shown that this new tool matching method can be effectively applied to overlay metrology.

Citation Download Citation

Jennifer Morningstar, Eric Solecky, Chas Archie, and Bill Banke "Metrology tool fleet management: applying FMP tool matching and monitoring concepts to an overlay fleet", Proc. SPIE 6152, Metrology, Inspection, and Process Control for Microlithography XX, 615212 (24 March 2006); https://doi.org/10.1117/12.655578

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available