Paper
15 March 2006 Catadioptric lens design: the breakthrough to hyper-NA optics
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Abstract
To enable optical lithography for sub 55 nm features, ArF immersion lithography requires numerical apertures to be significantly larger than 1 - thus leading to new challenges for optical design. Refractive lens designs are not capable to capture these extreme etendues. Catadioptric lens designs can overcome these fundamental issues by keeping the diameters of the optical materials acceptable. We have studied various catadioptric design approaches. The main criteria used to evaluate the potential of the different solutions include mechanical complexity, reticle compatibility, optical sensitivities, polarization capabilities, image field shape, as well as enabling extendibility to even higher NAs. Our assessment leads us to a new design type called catadioptric in-line design which shows superior performance for high NA systems with NA > 1.1.
© (2006) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Bernhard Kneer, Paul Gräupner, Reiner Garreis, Ralph Kläsges, and Heiko Feldmann "Catadioptric lens design: the breakthrough to hyper-NA optics", Proc. SPIE 6154, Optical Microlithography XIX, 615420 (15 March 2006); https://doi.org/10.1117/12.668024
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Cited by 4 scholarly publications.
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KEYWORDS
Mirrors

Combined lens-mirror systems

Lens design

Coating

Optical design

Polarization

Chemical elements

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