Paper
14 March 2006 Accurate OPC model generation through use of a streamlined data flow incorporating automated test-structure layout and CD-SEM recipe generation
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Abstract
In this paper we present a method that optimizes the OPC model generation process. The elements in this optimized flow include: an automated test structure layout engine; automated SEM recipe creation and data collection; and OPC model anchoring/validation software. The flow is streamlined by standardizing and automating these steps and their inputs and outputs. A major benefit of this methodology is the ability to perform multiple OPC "screening" refinement loops in a short time before embarking on final model generation. Each step of the flow is discussed in detail, as well as our multi-pass experimental design for converging on a final OPC data set. Implementation of this streamlined process flow drastically reduces the time to complete OPC modeling, and allows generation of multiple complex OPC models in a short time, resulting in faster release and transfer of a next-generation product to manufacturing.
© (2006) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Mary Coles, Lewis Flanagin, Ben Rathsack, Steve Prins, and James Blatchford "Accurate OPC model generation through use of a streamlined data flow incorporating automated test-structure layout and CD-SEM recipe generation", Proc. SPIE 6156, Design and Process Integration for Microelectronic Manufacturing IV, 615614 (14 March 2006); https://doi.org/10.1117/12.660600
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Cited by 2 scholarly publications.
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KEYWORDS
Data modeling

Optical proximity correction

Scanning electron microscopy

SRAF

Semiconducting wafers

Image filtering

Photomasks

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