Measurement of a silicon-based nonsilicon MEMS micromirror

Yuan Luo; Yi Zhang; Xiaodong Xu

doi:10.1117/12.716174

13 October 2006 Measurement of a silicon-based nonsilicon MEMS micromirror

Yuan Luo, Yi Zhang, Xiaodong Xu

Proceedings Volume 6280, Third International Symposium on Precision Mechanical Measurements; 628018 (2006) https://doi.org/10.1117/12.716174
Event: Third International Symposium on Precision Mechanical Measurements, 2006, Urumqi, China

Abstract

Optical devices are playing important roles for all optical network(AON) and micro electro mechanical system (MEMS) technology is a core technology for optical devices because of its compactness, high integration level and cheapness. MEMS micromirror is a key structure for some kinds of MEMS devices such as optical switch, variable optical attenuator (VOA) and so on. The characteristics of the MEMS optical micromirror will determine the performances of the devices. In this paper, some important optical and mechanical parameters of the novel silicon-based non-silicon MEMS micromirror are measured, especially the torsion angle which is tested by using digital image processing. The testing data presents that the surface topography of the novel micromirror is smoother than that of poly-silicon micromirror and the reflective characteristic is also well. After building a micromirror angle testing digital image processing system, the rotating angle of the micromirror is measured and the result shows that the micromirror could be rotated with an angle based on theoretical analysis.

Citation Download Citation

Yuan Luo, Yi Zhang, and Xiaodong Xu "Measurement of a silicon-based nonsilicon MEMS micromirror", Proc. SPIE 6280, Third International Symposium on Precision Mechanical Measurements, 628018 (13 October 2006); https://doi.org/10.1117/12.716174

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