Paper
21 June 2006 Calibration of test masks used for lithography lens systems
M. Arnz, W. Häβler-Grohne, B. Bodermann, H. Bosse
Author Affiliations +
Proceedings Volume 6281, 22nd European Mask and Lithography Conference; 62810C (2006) https://doi.org/10.1117/12.692735
Event: 22nd European Mask and Lithography Conference, 2006, Dresden, Germany
Abstract
We report on the calibration approach and results as well as the application of special test masks for the qualification process of projection lens systems for advanced wafer steppers and scanners. We concentrate here on two different sets of test masks. One test mask set was designed for aerial image based contrast metrology while the other set of qualification masks was applied to provide an absolute reference for the magnification of the lens system. On the contrast test masks we measured variations of CD ratios of about 10% for differently oriented structures. Additionally we compared the lithography lens magnification obtained by using both grating test masks calibrated by the PTB with a pitch ratio uncertainty of 5 x 10-7 with that obtained by employing alternative external scale calibration standards.
© (2006) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
M. Arnz, W. Häβler-Grohne, B. Bodermann, and H. Bosse "Calibration of test masks used for lithography lens systems", Proc. SPIE 6281, 22nd European Mask and Lithography Conference, 62810C (21 June 2006); https://doi.org/10.1117/12.692735
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Cited by 2 patents.
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KEYWORDS
Photomasks

Calibration

Lithography

Optical design

Modulation transfer functions

Critical dimension metrology

Metrology

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