ORC and LfD as first steps towards DfM

Reinhard März; Kai Peter; Wilhelm Maurer

doi:10.1117/12.692641

21 June 2006 ORC and LfD as first steps towards DfM

Reinhard März, Kai Peter, Wilhelm Maurer

Proceedings Volume 6281, 22nd European Mask and Lithography Conference; 62810I (2006) https://doi.org/10.1117/12.692641
Event: 22nd European Mask and Lithography Conference, 2006, Dresden, Germany

Abstract

The role the Optical Rule Check (ORC) in the design flow and future directions are discussed, the benefit of the model-based methodology is illustrated by using realistic layout situations. Concepts for implementation of Litho-friendly Design (LfD), i.e., of layout optimization and lithography simulations in the pre-tapeout design flow are developed.

Citation Download Citation

Reinhard März, Kai Peter, and Wilhelm Maurer "ORC and LfD as first steps towards DfM", Proc. SPIE 6281, 22nd European Mask and Lithography Conference, 62810I (21 June 2006); https://doi.org/10.1117/12.692641

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