Fabrication of autocloned photonic crystals by using electron-beam gun with ion-assisted deposition

Te-Hung Chang; Sheng-Hui Chen; Chien-Cheng Kuo; Cheng-Chung Lee

doi:10.1117/12.678736

31 August 2006 Fabrication of autocloned photonic crystals by using electron-beam gun with ion-assisted deposition

Te-Hung Chang, Sheng-Hui Chen, Chien-Cheng Kuo, Cheng-Chung Lee

Proceedings Volume 6327, Nanoengineering: Fabrication, Properties, Optics, and Devices III; 632708 (2006) https://doi.org/10.1117/12.678736
Event: SPIE Optics + Photonics, 2006, San Diego, California, United States

Abstract

Autocloning technique is an attractive deposition method to make photonic crystals since it can produce various photonic crystals by changing the substrate periodicity and the structure of the stacking materials. We report a novel method to fabricate autocloned photonic crystals. This method has better step-coverage, higher deposition rate and large deposition area than the sputtering method. We successfully preserved the periodic surface corrugation after the deposition of multilayer stacks by using an E-beam gun evaporation with ion-assisted deposition (IAD). Freedoms of the shaping process can be controlled by the power of IAD and the time of the ion source etching. The ion source etching is a physical etching process without any chemical reaction and dangerously reactive gas. The process parameters were described in this paper. During the deposition process, the refractive index can be adjusted by changing the deposition rate and the substrate temperature. The deposition rate was about 0.7~1 nm/s for SiO₂ which is almost ten times faster than the sputtering method. So this method is good for the mass production of photonic crystals.

Citation Download Citation

Te-Hung Chang, Sheng-Hui Chen, Chien-Cheng Kuo, and Cheng-Chung Lee "Fabrication of autocloned photonic crystals by using electron-beam gun with ion-assisted deposition", Proc. SPIE 6327, Nanoengineering: Fabrication, Properties, Optics, and Devices III, 632708 (31 August 2006); https://doi.org/10.1117/12.678736

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available

Members: $17.00

Non-members: $21.00 ADD TO CART

PROCEEDINGS
9 PAGES

DOWNLOAD PAPER SAVE TO MY LIBRARY

GET CITATION

RIGHTS & PERMISSIONS

Get copyright permission Get copyright permission on Copyright Marketplace

KEYWORDS

Ion beams

Etching

Ions

Photonic crystals

Multilayers

Thin film deposition

Deposition processes

Show All Keywords

Keywords/Phrases

Search In:

Publication Years