Paper
20 December 2006 Microfabrication of PLLA polymer by X-ray lithography
Yigui Li, Susumu Sugiyama
Author Affiliations +
Proceedings Volume 6415, Micro- and Nanotechnology: Materials, Processes, Packaging, and Systems III; 64150H (2006) https://doi.org/10.1117/12.694855
Event: SPIE Smart Materials, Nano- and Micro-Smart Systems, 2006, Adelaide, Australia
Abstract
Poly-L-Lactides(PLLA) is a biodegradable polymer material which is sensitive to X-ray as a resist and free of stress crack formation. The fabrication technique to generate the PLLA micro structures with the very smooth sidewall is demonstrated. The function of X-ray on PLLA polymer material is breaking the PLLA polymer main chain and generating intermediates which can be degraded further and finally dissolved by the solvent interaction. In this paper, we have illustrated PLLA polymer is a new resist material for x-ray lithography and can be developed in alkaline developers after x-ray exposure. Various polymer structures are fabricated using this novel X-ray lithography technique. The PLLA structure sidewall obtained by this process is very smooth compared with that of other micromachining methods. The result after 0.02Ahour X-ray exposure dosage and developed in NaOH (1N) developer for 1 hour at room temperature shows the smooth sidewall by consuming PLLA to generate lactic acid salts. The depth of the micro PLLA structure is about 150μm and the RMS value of the sidewall roughness was within 200nm. The data of exposure doses against the processed depth on the PLLA sheet is shown.
© (2006) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Yigui Li and Susumu Sugiyama "Microfabrication of PLLA polymer by X-ray lithography", Proc. SPIE 6415, Micro- and Nanotechnology: Materials, Processes, Packaging, and Systems III, 64150H (20 December 2006); https://doi.org/10.1117/12.694855
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KEYWORDS
Polymers

X-rays

X-ray lithography

Photomasks

Silicon

Fabrication

Gold

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