Detection signal analysis of actinic inspection of EUV mask blanks using dark-field imaging

Toshihiko Tanaka; Tsuneo Terasawa; Nobuyuki Iriki; Hajime Aoyama; Toshihisa Tomie

doi:10.1117/12.711263

15 March 2007 Detection signal analysis of actinic inspection of EUV mask blanks using dark-field imaging

Toshihiko Tanaka, Tsuneo Terasawa, Nobuyuki Iriki, Hajime Aoyama, Toshihisa Tomie

Proceedings Volume 6517, Emerging Lithographic Technologies XI; 65171Y (2007) https://doi.org/10.1117/12.711263
Event: SPIE Advanced Lithography, 2007, San Jose, California, United States

Abstract

The development of defect-free mask blanks including inspection is one of challenges for the implementation of extreme ultraviolet lithography (EUVL). Among others, inspection of multilayer coated mask blanks with no oversight of critical defects is a challenging issue for providing mask blanks with free defects. In this paper, the printability of a small defect located underneath the reflective multilayer is studied, and the possibility of inspection of the defect is investigated using MIRAI proof-of concept (POC) actinic inspection tool with a 26x Schwarzschild optics of numerical aperture (NA) of 0.2. A critical defect giving a troublesome CD change can be detected. And the through focus characteristics in various shape defects are also analyzed.

Citation Download Citation

Toshihiko Tanaka, Tsuneo Terasawa, Nobuyuki Iriki, Hajime Aoyama, and Toshihisa Tomie "Detection signal analysis of actinic inspection of EUV mask blanks using dark-field imaging", Proc. SPIE 6517, Emerging Lithographic Technologies XI, 65171Y (15 March 2007); https://doi.org/10.1117/12.711263

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