Rigorous simulation study of mask gratings at conical illumination

Roderick Köhle

doi:10.1117/12.729018

15 May 2007 Rigorous simulation study of mask gratings at conical illumination

Roderick Köhle

Proceedings Volume 6607, Photomask and Next-Generation Lithography Mask Technology XIV; 66072Z (2007) https://doi.org/10.1117/12.729018
Event: Photomask and Next-Generation Lithography Mask Technology XIV, 2007, Yokohama, Japan

Abstract

For immersion technology the mask is illuminated under large angles and the features sizes are approaching the illuminating wavelength. At such operating conditions, several publications have shown rigorous diffraction effects having a noticeable effect on the aerial image. For the Kirchhoff assumption, which is commonly employed in lithography simulation, the mask is assumed to be an infinity thin transparency. This assumption implies the diffracted spectrum to be independent of the incident illumination angle and no coupling between polarization states occurs. This work is a fundamental study to deepen the understanding of rigorous off-axis effects for current and future mask technologies. This paper will show simulation studies for standard attenuated- and alternating mask gratings, which look at the diffracted spectrum of a mask grating with respect to polarization orientation and off-axis angle of the illuminating wave.

Citation Download Citation

Roderick Köhle "Rigorous simulation study of mask gratings at conical illumination", Proc. SPIE 6607, Photomask and Next-Generation Lithography Mask Technology XIV, 66072Z (15 May 2007); https://doi.org/10.1117/12.729018

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