ZnO based diluted magnetic semiconductor thin films by RF magnetron sputtering for spin photonic devices

J. Elanchezhiyan; K. P. Bhuvana; N. Gopalakrishnan; T. Balasubramanian

doi:10.1117/12.734048

21 September 2007 ZnO based diluted magnetic semiconductor thin films by RF magnetron sputtering for spin photonic devices

J. Elanchezhiyan, K. P. Bhuvana, N. Gopalakrishnan, T. Balasubramanian

Author Affiliations +

Proceedings Volume 6674, Thin-Film Coatings for Optical Applications IV; 66740C (2007) https://doi.org/10.1117/12.734048
Event: Optical Engineering + Applications, 2007, San Diego, California, United States

Abstract

Transition metal (TM) doped ZnO is a promising diluted magnetic semiconductor (DMS) material for the fabrication of spintronics devices. In this paper, we have investigated Mn and Cr doped ZnO thin films grown by RF magnetron sputtering. The films grown on Si(100) and sapphire (Al₂O₃) have been characterized by X-ray diffraction (XRD) and Vibrating Sample Magnetometer (VSM) to know its structural and magnetic properties. The XRD results show that the Mn doped ZnO films deposited on Si (100) exhibit a polycrystalline nature whereas the films on sapphire substrate have only (002) preferential orientations indicating that the films are single crystalline. It has been observed from VSM studies that Zn_1-xMn_xO/Al₂O₃(0001) and Zn_1-xCr_xO/Si(100) system shows ferromagnetic nature while the paramagnetic behaviour observed in Zn_1-xMn_xO/Si(100) system.

Citation Download Citation

J. Elanchezhiyan, K. P. Bhuvana, N. Gopalakrishnan, and T. Balasubramanian "ZnO based diluted magnetic semiconductor thin films by RF magnetron sputtering for spin photonic devices", Proc. SPIE 6674, Thin-Film Coatings for Optical Applications IV, 66740C (21 September 2007); https://doi.org/10.1117/12.734048

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