Laser writing systems and technologies for fabrication of binary and continuous relief diffractive optical elements

A. G. Poleshchuk; V. P. Korolkov

doi:10.1117/12.751930

17 July 2007 Laser writing systems and technologies for fabrication of binary and continuous relief diffractive optical elements

A. G. Poleshchuk, V. P. Korolkov

Author Affiliations +

Proceedings Volume 6732, International Conference on Lasers, Applications, and Technologies 2007: Laser-assisted Micro- and Nanotechnologies; 67320X (2007) https://doi.org/10.1117/12.751930
Event: International Conference on Lasers, Applications, and Technologies '07, 2007, Minsk, Belarus

Abstract

Precision laser-writing systems operated in polar coordinates and direct writing technologies for fabrication of diffractive optical elements and computer generated holograms have been described. These systems can manufacture continuous-relief and binary microstructures with minimum feature sizes of less than 0.6 μm and laser beam positioning accuracy of 0.05 μm over 300-mm substrates. Hardware and software of the system permit to write on different types of photosensitive and thermal recording materials. Several examples of fabricated diffractive elements have been presented.

Citation Download Citation

A. G. Poleshchuk and V. P. Korolkov "Laser writing systems and technologies for fabrication of binary and continuous relief diffractive optical elements", Proc. SPIE 6732, International Conference on Lasers, Applications, and Technologies 2007: Laser-assisted Micro- and Nanotechnologies, 67320X (17 July 2007); https://doi.org/10.1117/12.751930

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