Fabrication of waveguides by inductively coupled plasma etching on LiNbO3/LiTaO3 single crystal film by liquid phase epitaxy growth

Z. Ren; S. Yu; J. M. Marshall; D. Walker; P. A. Thomas

doi:10.1117/12.742842

21 November 2007 Fabrication of waveguides by inductively coupled plasma etching on LiNbO₃/LiTaO₃ single crystal film by liquid phase epitaxy growth

Z. Ren, S. Yu, J. M. Marshall, D. Walker, P. A. Thomas

Author Affiliations +

Proceedings Volume 6781, Passive Components and Fiber-based Devices IV; 67812H (2007) https://doi.org/10.1117/12.742842
Event: Asia-Pacific Optical Communications, 2007, Wuhan, China

Abstract

LiNbO₃ films of 1-10μm thick were grown on z-cut LiTaO₃ substrates using vanadium and boron based fluxes by liquid phase epitaxy (LPE) growth. Characterization of these films using scanning electron microscopy (SEM), electron backscattering diffraction and high-resolution X-ray diffraction (HRXRD) show that they are single-crystal and epitaxial with the substrate. Subsequently, LiNbO₃ films were etched by SF₆/Ar inductively coupled plasma (ICP) in order to fabricate straight ridge waveguides. Effects of parameters including working pressure, RIE power and ICP power are investigated and analyzed by measurement of etching depth, selectivity, etched surface state and sidewall profile by means of focused ion beam (FIB) etching, energy dispersive X-ray (EDX) analysis, SEM and surface profilometry. Optimized processes with high etching rates, good mask selectivity and near vertical profile have been achieved.

Citation Download Citation

Z. Ren, S. Yu, J. M. Marshall, D. Walker, and P. A. Thomas "Fabrication of waveguides by inductively coupled plasma etching on LiNbO₃/LiTaO₃ single crystal film by liquid phase epitaxy growth", Proc. SPIE 6781, Passive Components and Fiber-based Devices IV, 67812H (21 November 2007); https://doi.org/10.1117/12.742842

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