Paper
26 February 2008 Vertically integrated multimode interferometers for 3-D photonic circuits in SOI
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Abstract
We present vertically-integrated multimode interferometers that optically couple between waveguide layers of a three-dimensional photonic circuit. Coupling between these layers can be restricted to certain regions by selectively fabricating a silicon channel between them, resulting in an isolated multimode waveguide section. Simulations reveal that complete coupling between two waveguides that are 2 μm square is achieved over a length of 236 μm, when the separating silicon channel is 1 μm thick. Standard photolithography and etching techniques are used to fabricate a proof-of-concept device consisting of one waveguide coupling into a silicon waveguide that is vertically multimode.
© (2008) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Chris J. Brooks, Andrew P. Knights, and Paul E. Jessop "Vertically integrated multimode interferometers for 3-D photonic circuits in SOI", Proc. SPIE 6898, Silicon Photonics III, 68980Z (26 February 2008); https://doi.org/10.1117/12.763470
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Cited by 1 scholarly publication.
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KEYWORDS
Waveguides

Brain-machine interfaces

Silicon

Oxides

Channel waveguides

Semiconducting wafers

Photoresist materials

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