Paper
20 March 2008 Device-oriented directed self-assembly of Lamellar microdomains from a block copolymer containing hybrid
Ho-Cheol Kim, Joy Cheng, Oun-Ho Park, Sang-Min Park, Charles Rettner
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Abstract
Directed self-assembly (DSA) of a block copolymer containing hybrid material using topographic guiding patterns is presented in this paper. Lamellar microdomains of the hybrid material, which is a mixture of poly(styrene-b-ethylene oxide) (PS-b-PEO) and organosilicate (OS) precursor, have orientational correlation length about five times longer than typical organic block copolymers such as poly(styrene-b-methyl methacrylate) (PS-b-PMMA). The longer correlation length (i.e. bigger grain size) makes it possible to align the lamellar microdomain into geometries similar to device layouts. We report one-dimensional assembly of lamellar microdomains on substrates, which gives crossbar and multifinger nanostructures.
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Ho-Cheol Kim, Joy Cheng, Oun-Ho Park, Sang-Min Park, and Charles Rettner "Device-oriented directed self-assembly of Lamellar microdomains from a block copolymer containing hybrid", Proc. SPIE 6921, Emerging Lithographic Technologies XII, 69212B (20 March 2008); https://doi.org/10.1117/12.772723
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KEYWORDS
Directed self assembly

Scanning electron microscopy

Photomicroscopy

Electron beam lithography

Picosecond phenomena

Oxides

Polymethylmethacrylate

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