Phenomenological analysis of carbon deposition rate on the multilayer mirror

Takahiro Nakayama; Hiromitsu Takase; Shigeru Terashima; Takashi Sudo; Yutaka Watanabe; Yasuaki Fukuda; Katsuhiko Murakami; Shintaro Kawata; Takashi Aoki; Shuichi Matsunari; Yukinobu Kakutani; Masahito Niibe

doi:10.1117/12.769958

21 March 2008 Phenomenological analysis of carbon deposition rate on the multilayer mirror

Takahiro Nakayama, Hiromitsu Takase, Shigeru Terashima, Takashi Sudo, Yutaka Watanabe, Yasuaki Fukuda, Katsuhiko Murakami, Shintaro Kawata, Takashi Aoki, Shuichi Matsunari, Yukinobu Kakutani, Masahito Niibe

Author Affiliations +

Proceedings Volume 6921, Emerging Lithographic Technologies XII; 69213B (2008) https://doi.org/10.1117/12.769958
Event: SPIE Advanced Lithography, 2008, San Jose, California, United States

Abstract

It is very important to mitigate oxidation of multilayer mirrors (MLMs) and carbon deposition onto MLMs to extend the lifetime of EUV exposure tool. We focused on carbon deposition on Si-capped multilayer mirror. We made experiments of EUV irradiation to the multilayer mirrors using an EUV irradiation apparatus connected to a beam line (SBL -2) of synchrotron radiation facility Super-ALIS in the NTT Atsugi research and development center. Thickness of deposited carbon was obtained by using XPS. We investigated carbon deposition rates at various partial pressures of various organic species. Phenomenological analysis was applied to the obtained carbon deposition rate. Carbon deposition rate was proportional to the pressure at the proportional EUV intensity. Applying this normalization of the deposition rate and the EUV intensity, carbon deposition rate seems to behave according to each universal function for each hydrocarbon species.

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Takahiro Nakayama, Hiromitsu Takase, Shigeru Terashima, Takashi Sudo, Yutaka Watanabe, Yasuaki Fukuda, Katsuhiko Murakami, Shintaro Kawata, Takashi Aoki, Shuichi Matsunari, Yukinobu Kakutani, and Masahito Niibe "Phenomenological analysis of carbon deposition rate on the multilayer mirror", Proc. SPIE 6921, Emerging Lithographic Technologies XII, 69213B (21 March 2008); https://doi.org/10.1117/12.769958

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