Synthesis and properties of new anionic photoacid generators bound polymer resists for e-beam and EUV lithography

Mingxing Wang; Cheng-Tsung Lee; Clifford L. Henderson; Wang Yueh; Jeanette M. Roberts; Kenneth E. Gonsalves

doi:10.1117/12.769004

26 March 2008 Synthesis and properties of new anionic photoacid generators bound polymer resists for e-beam and EUV lithography

Mingxing Wang, Cheng-Tsung Lee, Clifford L. Henderson, Wang Yueh, Jeanette M. Roberts, Kenneth E. Gonsalves

Author Affiliations +

Proceedings Volume 6923, Advances in Resist Materials and Processing Technology XXV; 692312 (2008) https://doi.org/10.1117/12.769004
Event: SPIE Advanced Lithography, 2008, San Jose, California, United States

Abstract

A new series of methacrylate substituted benzene sulfonic photoacid generators (PAGs) and a perfluoro alkanesulfonic PAG, bound polymeric resists based on hydroxystyrene (HS) and 2-ethyl-2-adamantyl methacrylate (EA) were prepared and characterized. The acid yield of these PAG bound polymer resists was among the range of 54-81% under deep ultraviolet exposure (254 nm) that agrees well with the electron withdrawing effect of the substituents on the PAG anion for enhancing acid generation efficiency. The intrinsic lithography performance of these polymer-bound PAG resists showed sub-50 nm half-pitch resolution and < 5 nm LER (3σ).

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Mingxing Wang, Cheng-Tsung Lee, Clifford L. Henderson, Wang Yueh, Jeanette M. Roberts, and Kenneth E. Gonsalves "Synthesis and properties of new anionic photoacid generators bound polymer resists for e-beam and EUV lithography", Proc. SPIE 6923, Advances in Resist Materials and Processing Technology XXV, 692312 (26 March 2008); https://doi.org/10.1117/12.769004

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