Rigorous coupled-wave analysis for the optical character of multi-layer dielectric thin film

Weijin Kong; Cuichun Ling; Maojin Yun; Xin Sun; Jianda Shao; Zhengxiu Fan

doi:10.1117/12.792248

11 March 2008 Rigorous coupled-wave analysis for the optical character of multi-layer dielectric thin film

Weijin Kong, Cuichun Ling, Maojin Yun, Xin Sun, Jianda Shao, Zhengxiu Fan

Proceedings Volume 6984, Sixth International Conference on Thin Film Physics and Applications; 69843U (2008) https://doi.org/10.1117/12.792248
Event: Sixth International Conference on Thin Film Physics and Applications, 2007, Shanghai, China

Abstract

The optical property of multi-layer dielectric thin film is determined by its operation on the more or less complete cancellation of the light reflected at the upper and lower of the multi-layer interface of the thin film. An enhanced, numerically stable transmittance matrix approach based on rigorous coupled-wave analysis (RCWA) is applied to the analysis of optical character for multi-layer dielectric thin film. A design of a thin film stack used in multi-lay dielectric grating was presented by using the method of RCWA. The numerical calculation shows that RCWA is a relatively straightforward and deterministic technique for analysis the optical property of multi-layer dielectric thin film.

Citation Download Citation

Weijin Kong, Cuichun Ling, Maojin Yun, Xin Sun, Jianda Shao, and Zhengxiu Fan "Rigorous coupled-wave analysis for the optical character of multi-layer dielectric thin film", Proc. SPIE 6984, Sixth International Conference on Thin Film Physics and Applications, 69843U (11 March 2008); https://doi.org/10.1117/12.792248

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