Photonic devices based on patterning by two photon induced polymerization techniques

I. Fortunati; T. Dainese; R. Signorini; R. Bozio; V. Tagliazucca; S. Dirè; G. Lemercier; J.-C. Mulatier; C. Andraud; P. Schiavuta; A. Rinaldi; S. Licoccia; J. Bottazzo; A. Franco Perez; M. Guglielmi; G. Brusatin

doi:10.1117/12.786414

23 April 2008 Photonic devices based on patterning by two photon induced polymerization techniques

I. Fortunati, T. Dainese, R. Signorini, R. Bozio, V. Tagliazucca, S. Dirè, G. Lemercier, J.-C. Mulatier, C. Andraud, P. Schiavuta, A. Rinaldi, S. Licoccia, J. Bottazzo, A. Franco Perez, M. Guglielmi, G. Brusatin

Author Affiliations +

Proceedings Volume 6988, Nanophotonics II; 69881J (2008) https://doi.org/10.1117/12.786414
Event: SPIE Photonics Europe, 2008, Strasbourg, France

Abstract

Two and three dimensional structures with micron and submicron resolution have been achieved in commercial resists, polymeric materials and sol-gel materials by several lithographic techniques. In this context, silicon-based sol-gel materials are particularly interesting because of their versatility, chemical and thermal stability, amount of embeddable active compounds. Compared with other micro- and nano-fabrication schemes, the Two Photon Induced Polymerization is unique in its 3D processing capability. The photopolymerization is performed with laser beam in the near-IR region, where samples show less absorption and less scattering, giving rise to a deeper penetration of the light. The use of ultrashort laser pulses allows the starting of nonlinear processes like multiphoton absorption at relatively low average power without thermally damaging the samples. In this work we report results on the photopolymerization process in hybrid organic-inorganic films based photopolymerizable methacrylate-containing Si-nanobuilding blocks. Films, obtained through sol-gel synthesis, are doped with a photo-initiator allowing a radical polymerization of methacrylic groups. The photo-initiator is activated by femtosecond laser source, at different input energies. The development of the unexposed regions is performed with a suitable solvent and the photopolymerized structures are characterized by microscopy techniques.

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I. Fortunati, T. Dainese, R. Signorini, R. Bozio, V. Tagliazucca, S. Dirè, G. Lemercier, J.-C. Mulatier, C. Andraud, P. Schiavuta, A. Rinaldi, S. Licoccia, J. Bottazzo, A. Franco Perez, M. Guglielmi, and G. Brusatin "Photonic devices based on patterning by two photon induced polymerization techniques", Proc. SPIE 6988, Nanophotonics II, 69881J (23 April 2008); https://doi.org/10.1117/12.786414

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