Optimization and characterization of transparent photocatalytic TiO2 thin films prepared by ion-assisted deposition

Redouan Boughaled; Sebastian Schlichting; Henrik Ehlers; Detlev Ristau; Inga Bannat; Michael Wark

doi:10.1117/12.797719

25 September 2008 Optimization and characterization of transparent photocatalytic TiO₂ thin films prepared by ion-assisted deposition

Redouan Boughaled, Sebastian Schlichting, Henrik Ehlers, Detlev Ristau, Inga Bannat, Michael Wark

Author Affiliations +

Proceedings Volume 7101, Advances in Optical Thin Films III; 71010K (2008) https://doi.org/10.1117/12.797719
Event: Optical Systems Design, 2008, Glasgow, Scotland, United Kingdom

Abstract

The term photocatalysis is used to describe a photon-driven catalytic process. Titanium dioxide is a well-known photocatalyst in such fields as self-cleaning material and anti-microbial effects. Besides these photocatalytic applications, TiO₂ is a widely-used high index material for optical thin films. In the present investigation, the photocatalytic activity of transparent TiO₂ thin films was optimized to achieve multifunctional high precision optical coatings. The films have been deposited by ion assisted deposition (IAD), applying a Leybold APS plasma source as well as a Denton CC-105 ion source. The cause-and-effect chain between the use of different parameters in the IAD process and optical properties of the TiO₂ layers as well as their photocatalytic activities are described. As test reaction for the determination of the photocatalytic properties, the degradation of methylene blue (MB) was chosen. The used setup based on a high precision two-path laser measurement system was developed by the LZH in order to determine the kinetic performance of TiO₂ catalysts under well-defined UV illumination conditions. Photonic efficiencies of the TiO₂ thin films were calculated from the obtained data. Additionally, crystal structure analysis has been investigated for the identification of anatase and rutile modifications. The comparison of the results shows that ion assisted deposition is an appropriate technology for the preparation of photocatalytic active thin films for optical applications.

Citation Download Citation

Redouan Boughaled, Sebastian Schlichting, Henrik Ehlers, Detlev Ristau, Inga Bannat, and Michael Wark "Optimization and characterization of transparent photocatalytic TiO₂ thin films prepared by ion-assisted deposition", Proc. SPIE 7101, Advances in Optical Thin Films III, 71010K (25 September 2008); https://doi.org/10.1117/12.797719

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KEYWORDS

Titanium dioxide

Ions

Thin films

Optical coatings

Ultraviolet radiation

Thin film coatings

Crystals

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