Paper
17 October 2008 Results obtained with the CHARPAN Engineering Tool and prospects of the ion Mask Exposure Tool (iMET)
Elmar Platzgummer, Hans Loeschner, Gerhard Gross
Author Affiliations +
Abstract
Projection Mask-Less Patterning (PMLP) is based on many hundred thousands of ion beams working in parallel. A PMLP proof-of-concept tool has been realized as part of the European project CHARPAN (Charged Particle Nanotech) and has been presented at SPIE Photomask BACUS 2007. Using 10 keV protons, 16nm hp resolution has been demonstrated in non- CAR materials (HSQ) with 25μC/cm2 exposure dose. The system is upgraded to a CHARPAN Engineering Tool (CHET) with a laser-interferometer controlled vacuum stage and a CMOS based programmable Aperture Plate System (APS) providing ca. 40,000 beams with < 20nm spot size. The engineering of an ion Mask Exposure Tool (iMET) for the 22nm hp mask node has been started; main iMET features are discussed.
© (2008) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Elmar Platzgummer, Hans Loeschner, and Gerhard Gross "Results obtained with the CHARPAN Engineering Tool and prospects of the ion Mask Exposure Tool (iMET)", Proc. SPIE 7122, Photomask Technology 2008, 71220L (17 October 2008); https://doi.org/10.1117/12.801441
Lens.org Logo
CITATIONS
Cited by 8 scholarly publications.
Advertisement
Advertisement
RIGHTS & PERMISSIONS
Get copyright permission  Get copyright permission on Copyright Marketplace
KEYWORDS
Ions

Photomasks

Ion beams

Hydrogen

Line edge roughness

Nanotechnology

Electrodes

Back to Top