Model-based sub-resolution assist features using an inverse lithography method

Jue-Chin Yu; Peichen Yu; Hsueh-Yung Chao

doi:10.1117/12.804678

4 December 2008 Model-based sub-resolution assist features using an inverse lithography method

Jue-Chin Yu, Peichen Yu, Hsueh-Yung Chao

Proceedings Volume 7140, Lithography Asia 2008; 714014 (2008) https://doi.org/10.1117/12.804678
Event: SPIE Lithography Asia - Taiwan, 2008, Taipei, Taiwan

Abstract

The conventional segment-based OPC approach has been applied successfully for many CMOS generations and is currently favored. However, Inverse lithography technology (ILT) is a promising candidate for next-generation optical proximity correction (OPC). Still, there are issues that need to be thoroughly addressed and further optimized. In this work, we propose a model-based pre-OPC flow where the sizing of drawn patterns and placement of surrounding sub-resolution assist features (SRAF) are simultaneously generated in a single iteration using an ILT method. The complex patterns can then be simplified for a conventional OPC solution.

Citation Download Citation

Jue-Chin Yu, Peichen Yu, and Hsueh-Yung Chao "Model-based sub-resolution assist features using an inverse lithography method", Proc. SPIE 7140, Lithography Asia 2008, 714014 (4 December 2008); https://doi.org/10.1117/12.804678

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