Chromatic sensor-based- profilometer for the focusing mirror in the Scanning Helium Microscope

D. Litwin; J. Galas; S. Sitarek; B. Surma; B. Piatkowski

doi:10.1117/12.822411

20 November 2008 Chromatic sensor-based- profilometer for the focusing mirror in the Scanning Helium Microscope

D. Litwin, J. Galas, S. Sitarek, B. Surma, B. Piatkowski

Proceedings Volume 7141, 16th Polish-Slovak-Czech Optical Conference on Wave and Quantum Aspects of Contemporary Optics; 71411T (2008) https://doi.org/10.1117/12.822411
Event: 16th Polish-Slovak-Czech Optical Conference on Wave and Quantum Aspects of Contemporary Optics, 2008, Polanica Zdroj, Poland

Abstract

The paper is aimed at describing measurement methodology for characterizing quality of a silicon wafer applied as a focusing element in the Scanning Helium Microscope and continues the struggle against phenomena decreasing accuracy. The focusing mirror being the heart of the system and the decisive factor, which defines the resolution of the microscope, indicates the importance of testing methods. The systems made specially for this purpose provide the ability to create maps of the surface shape, thickness and surface roughness of the wafers. The paper shows many multidisciplinary issues associated with the measurements procedures and concludes with discussion on accuracy limits.

Citation Download Citation

D. Litwin, J. Galas, S. Sitarek, B. Surma, and B. Piatkowski "Chromatic sensor-based- profilometer for the focusing mirror in the Scanning Helium Microscope", Proc. SPIE 7141, 16th Polish-Slovak-Czech Optical Conference on Wave and Quantum Aspects of Contemporary Optics, 71411T (20 November 2008); https://doi.org/10.1117/12.822411

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