Optical, mechanical, and electro-optical design of an interferometric test station for massive parallel inspection of MEMS and MOEMS

Kay Gastinger; Karl Henrik Haugholt; Malgorzata Kujawinska; Michal Jozwik; Christoph Schaeffel; Stephan Beer

doi:10.1117/12.828162

17 June 2009 Optical, mechanical, and electro-optical design of an interferometric test station for massive parallel inspection of MEMS and MOEMS

Kay Gastinger, Karl Henrik Haugholt, Malgorzata Kujawinska, Michal Jozwik, Christoph Schaeffel, Stephan Beer

Author Affiliations +

Proceedings Volume 7389, Optical Measurement Systems for Industrial Inspection VI; 73891J (2009) https://doi.org/10.1117/12.828162
Event: SPIE Europe Optical Metrology, 2009, Munich, Germany

Abstract

The paper presents the optical, mechanical, and electro-optical design of an interferometric inspection system for massive parallel inspection of MicroElectroMechanicalSystems (MEMS) and MicroOptoElectroMechanicalSystems (MOEMS). The basic idea is to adapt a micro-optical probing wafer to the M(O)EMS wafer under test. The probing wafer is exchangeable and contains a micro-optical interferometer array. A low coherent and a laser interferometer array are developed. Two preliminary interferometer designs are presented; a low coherent interferometer array based on a Mirau configuration and a laser interferometer array based on a Twyman-Green configuration. The optical design focuses on the illumination and imaging concept for the interferometer array. The mechanical design concentrates on the scanning system and the integration in a standard test station for micro-fabrication. Models of single channel low coherence and laser interferometers and preliminary measurement results are presented. The smart-pixel approach for massive parallel electro-optical detection and data reduction is discussed.

Citation Download Citation

Kay Gastinger, Karl Henrik Haugholt, Malgorzata Kujawinska, Michal Jozwik, Christoph Schaeffel, and Stephan Beer "Optical, mechanical, and electro-optical design of an interferometric test station for massive parallel inspection of MEMS and MOEMS", Proc. SPIE 7389, Optical Measurement Systems for Industrial Inspection VI, 73891J (17 June 2009); https://doi.org/10.1117/12.828162

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