Index patterning of photoreactive polymers

Ute Daschiel; Roman Führer; Thomas Bauer; Georg Jakopic; Volker Schmidt; Valentin Satzinger; Gisbert Riess; Wolfgang Kern

doi:10.1117/12.828335

20 August 2009 Index patterning of photoreactive polymers

Ute Daschiel, Roman Führer, Thomas Bauer, Georg Jakopic, Volker Schmidt, Valentin Satzinger, Gisbert Riess, Wolfgang Kern

Author Affiliations +

Proceedings Volume 7413, Linear and Nonlinear Optics of Organic Materials IX; 74130V (2009) https://doi.org/10.1117/12.828335
Event: SPIE Photonic Devices + Applications, 2009, San Diego, California, United States

Abstract

Photoreactive polymeric materials have been investigated under one-photon (linear) and two photon (non linear) absorption conditions. A selected chromophore, 4-(N,N-diphenylamino)phenyl benzoate, was covalently attached to different polymer backbones (polystyrene, polynorbornene and polysiloxane). It is shown, that the predominant photoreaction of the chromophore is a photo-decarboxylation (extrusion of CO2) both for two-photon and one-photon conditions. The large increase in refractive index, which results from this reaction, allows the optical patterning of the polymeric systems by conventional and two-photon radiation processes. The materials were investigated by ellipsometry, UV-VIS and FT-IR spectroscopy, FT-IR and phase contrast microscopy. Under two-photon conditions, three-dimensional index structures were inscribed in the polymers, which can be used as optical waveguides.

Citation Download Citation

Ute Daschiel, Roman Führer, Thomas Bauer, Georg Jakopic, Volker Schmidt, Valentin Satzinger, Gisbert Riess, and Wolfgang Kern "Index patterning of photoreactive polymers", Proc. SPIE 7413, Linear and Nonlinear Optics of Organic Materials IX, 74130V (20 August 2009); https://doi.org/10.1117/12.828335

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