K-alpha x-ray source using high energy and high repetition rate laser system for phase contrast imaging

Cristina Serbanescu; Sylvain Fourmaux; Jean-Claude Kieffer; Russell Kincaid; Andrzej Krol

doi:10.1117/12.826646

28 September 2009 K-alpha x-ray source using high energy and high repetition rate laser system for phase contrast imaging

Cristina Serbanescu, Sylvain Fourmaux, Jean-Claude Kieffer, Russell Kincaid, Andrzej Krol

Author Affiliations +

Proceedings Volume 7451, Soft X-Ray Lasers and Applications VIII; 745115 (2009) https://doi.org/10.1117/12.826646
Event: SPIE Optical Engineering + Applications, 2009, San Diego, California, United States

Abstract

K-alpha x-ray sources from laser produced plasmas provide completely new possibilities for x-ray phase-contrast imaging applications. By tightly focusing intense femtosecond laser pulses onto a solid target, K-alpha x-ray pulses are generated through the interaction of energetic electrons created in the plasma with the bulk target. In this paper, we present a continuous and efficient Mo K-alpha x-ray source produced by a femtosecond laser system operating at 100 Hz repetition rate with maximum pulse energy of 110 mJ before compression. The source has x-ray conversion efficiency greater than 10^-5 into K-alpha line emission. In preparation for phase contrast imaging applications, the size of the resultant K-alpha x-ray emission spot has been also characterized. The source exhibits sufficient spatial coherence to observe phase contrast. We observe a relatively small broadening of the K-alpha source size compared to the size of the laser beam itself. Detailed characterization of the source including the x-ray spectrum and the x-ray average yield along with phase contrast images of test objects will be presented.

Citation Download Citation

Cristina Serbanescu, Sylvain Fourmaux, Jean-Claude Kieffer, Russell Kincaid, and Andrzej Krol "K-alpha x-ray source using high energy and high repetition rate laser system for phase contrast imaging", Proc. SPIE 7451, Soft X-Ray Lasers and Applications VIII, 745115 (28 September 2009); https://doi.org/10.1117/12.826646

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