On-line measurement of profile parameters of rectangular holographic photoresist gratings during development

Shiming Wei; Lifeng Li

doi:10.1117/12.837778

20 November 2009 On-line measurement of profile parameters of rectangular holographic photoresist gratings during development

Shiming Wei, Lifeng Li

Author Affiliations +

Proceedings Volume 7511, 2009 International Conference on Optical Instruments and Technology: Optoelectronic Measurement Technology and Systems; 75110J (2009) https://doi.org/10.1117/12.837778
Event: International Conference on Optical Instrumentation and Technology, 2009, Shanghai, China

Abstract

This paper presents a method for on-line measuring photoresist grating profiles during the development process by detecting the diffraction efficiencies of surface-relief photoresist gratings on transparent substrates. A He-Ne laser of 594.1 nm wavelength is employed as the monitoring light source. Firstly, the groove depth of a grating is determined from the minimum value of the monitoring curve of the 0th-order transmission intensity. Then, with the groove depth known, the duty cycle of the grating is measured from the -1st-order transmission intensity. The feasibility of our method has been demonstrated through fabrication of many rectangular photoresist gratings of 1200, 2200, and 3000 lines/mm on glass substrates. Good agreement between the on-line, real-time measured results and the scanning electron microscopy results is obtained.

Citation Download Citation

Shiming Wei and Lifeng Li "On-line measurement of profile parameters of rectangular holographic photoresist gratings during development", Proc. SPIE 7511, 2009 International Conference on Optical Instruments and Technology: Optoelectronic Measurement Technology and Systems, 75110J (20 November 2009); https://doi.org/10.1117/12.837778

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