Design, fabrication, and control of scanning plasmonic probe for near-field photolithographic applications

Yu-Yen Huang; Yuyan Wang; Kazunori Hoshino; David Giese; Yujan Shrestha; Xiaojing Zhang

doi:10.1117/12.842625

16 February 2010 Design, fabrication, and control of scanning plasmonic probe for near-field photolithographic applications

Yu-Yen Huang, Yuyan Wang, Kazunori Hoshino, David Giese, Yujan Shrestha, Xiaojing Zhang

Author Affiliations +

Proceedings Volume 7591, Advanced Fabrication Technologies for Micro/Nano Optics and Photonics III; 75910C (2010) https://doi.org/10.1117/12.842625
Event: SPIE MOEMS-MEMS, 2010, San Francisco, California, United States

Abstract

We report the design, fabrication and operation of a scanning plasmonic probe compatible with a fully customized Near-field Scanning Microscope system. The probe is a silicon cantilever with a hollow pyramidal probe tip. A silicon dioxide layer was thermally grown to form the probe. A 100 nm thick aluminum layer was then e-beam evaporated onto the released probe tip to form the metal-dielectric interface for surface plasmonic wave propagation. A 500 nm diameter aperture was subsequently milled with the Focus Ion Beam. The probe was controlled with a built-in scanning controller for the probe-sample distance using a force sensing tuning fork. A tapered optical fiber, connected to 405 nm wavelength laser source, was aligned to the backside of the probe tip to serve as the light source. The transmitted light through the aperture was used to expose the photoresist (AZ 5209E), on a piece of cover glass attached on the tuning fork. The probe was controlled for near-field photolithography, where a series of 15 exposures, varied from 0 to 8 minutes, were carried out on the photoresist stepwise at 6.5 μm separation with subsequent 60 seconds development time. The transmitted light beam spot was simulated with a Full Width Half Maximum of 227 nm. Atomic Force Microscope measurement showed a 200 nm lateral resolution for the photolithography. The depths and widths of the developed patterns were linearly correlated with increasing exposure time, showing slopes of 0.76 nm/second and 1.4 nm/second respectively.

Citation Download Citation

Yu-Yen Huang, Yuyan Wang, Kazunori Hoshino, David Giese, Yujan Shrestha, and Xiaojing Zhang "Design, fabrication, and control of scanning plasmonic probe for near-field photolithographic applications", Proc. SPIE 7591, Advanced Fabrication Technologies for Micro/Nano Optics and Photonics III, 75910C (16 February 2010); https://doi.org/10.1117/12.842625

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KEYWORDS

Near field scanning optical microscopy

Optical lithography

Near field

Plasmonics

Photoresist materials

Silicon

Silica

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