Paper
2 April 2010 SLICE image analysis for diblock copolymer characterization and process optimization
Yang Hong, Li-Wen Chang, Albert Lin, H.-S. Philip Wong
Author Affiliations +
Abstract
While directed self-assembly of diblock copolymers is increasingly developed in terms of process flow, metrology and evaluation are the next crucial step in maximizing its effectiveness for integration into device design based on directed self-assembly trends. We present a novel image processing and data analysis program, SLICE (Sub-Lithography Imaging Computation and Evaluator), whose capabilities enable a systematic, automated analysis and characterization of directed self-assembly (SA) of block copolymers for high-density circuit integration. Key features such as defect-free region detection and trench-to-trench comparison of SA quality illustrate the potentially significant impact of SLICE to the process optimization and commercialization of sub-lithographic techniques.
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Yang Hong, Li-Wen Chang, Albert Lin, and H.-S. Philip Wong "SLICE image analysis for diblock copolymer characterization and process optimization", Proc. SPIE 7637, Alternative Lithographic Technologies II, 76371J (2 April 2010); https://doi.org/10.1117/12.848378
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KEYWORDS
Image processing

Directed self assembly

Scanning electron microscopy

Image analysis

Binary data

Image quality

Data analysis

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