Pattern deformation caused by deformed pellicle with ArF exposure

Jee-Hye You; Ilsin An; Hye-Keun Oh

doi:10.1117/12.846483

3 March 2010 Pattern deformation caused by deformed pellicle with ArF exposure

Jee-Hye You, Ilsin An, Hye-Keun Oh

Proceedings Volume 7640, Optical Microlithography XXIII; 76402E (2010) https://doi.org/10.1117/12.846483
Event: SPIE Advanced Lithography, 2010, San Jose, California, United States

Abstract

It will directly affects pellicle degradation, at the irradiated part of the pellicle, and make a sloped pellicle surface and will act like a prism before change of phase or transmittance occurs, because the energies of C, F and O single bondings composing the ArF pellicle film is quite smaller than the energy of 193 nm ArF. Thus, outgoing light has information of smaller space than mask size. In order to offer some tip to find the appearance of pellicle thinning caused defect, several types of pattern deformation caused by pellicle degradation is studied.

Citation Download Citation

Jee-Hye You, Ilsin An, and Hye-Keun Oh "Pattern deformation caused by deformed pellicle with ArF exposure", Proc. SPIE 7640, Optical Microlithography XXIII, 76402E (3 March 2010); https://doi.org/10.1117/12.846483

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