Paper
29 April 2010 Influence of fabrication accuracies of metal-dielectric layered flat lenses on their imaging properties
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Abstract
We report on simulations of the imaging properties of metal-dielectric layered flat lenses and their tolerance to experimental inaccuracies of layers thickness and errors of permittivity values of materials. The multilayer structure consisting of silver and amorphous TiO2 is optimised in terms of the transmission efficiency and FWHM of the point spread function. Standard deviation of thickness for both metals and dielectrics layers, accepted in simulations, are twice bigger than actual fabrication parameters determined with quartz crystal microbalance. The errors of material permittivity measurements are taken from literature. Numerical investigation of imaging properties of the lenses is performed with the transfer matrix method. The quality of surfaces of silica substrate, titanium oxide, gold, and silver layers is measured with atomic force microscope.
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Tomasz Stefaniuk, Rafal Kotynski, Grzegorz Nowak, and Tomasz Szoplik "Influence of fabrication accuracies of metal-dielectric layered flat lenses on their imaging properties", Proc. SPIE 7711, Metamaterials V, 77110G (29 April 2010); https://doi.org/10.1117/12.858004
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KEYWORDS
Silver

Multilayers

Point spread functions

Lenses

Titanium dioxide

Dielectrics

Metals

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