Through-pellicle defect repair for advanced photomasks

Tod Robinson; Roy White; Ron Bozak; Jeff LeClaire; Mike Archuletta; David Lee

doi:10.1117/12.865197

25 May 2010 Through-pellicle defect repair for advanced photomasks

Tod Robinson, Roy White, Ron Bozak, Jeff LeClaire, Mike Archuletta, David Lee

Proceedings Volume 7748, Photomask and Next-Generation Lithography Mask Technology XVII; 77480G (2010) https://doi.org/10.1117/12.865197
Event: Photomask and NGL Mask Technology XVII, 2010, Yokohama, Japan

Abstract

A developing reality with advancing DUV femto-second pulsed laser repair of advanced photomasks after pelliclization is a significant operational cost savings. This economic advantage comes from the elimination of a previously critical inspection step before mounting the pellicle on the mask. The laser repair processes developed allow reduce the number of times masks are cycled through mask inspection tools and prevent recontamination of the mask surface due to handling during and after the inspection before pelliclization. The latter would require, without effective through-pellicle repair, removal of the pellicle, repair and/or reclean, then re-inspection and re-pelliclization of the mask (assuming success with the first cycle of repair and/or reclean). Meanwhile, the cost and lack of feasibility for this additional process both increase the investment in the mask while at the same time bringing it closer to being completely scrapped. Recently developed processes that allow for effective through-pellicle laser repair on advanced photomask technologies (sub 65 nm node) are reviewed, that have economic advantages and also make the repair of lower-end (and higher volume) photomasks significantly more profitable to the typical mask maker.

Citation Download Citation

Tod Robinson, Roy White, Ron Bozak, Jeff LeClaire, Mike Archuletta, and David Lee "Through-pellicle defect repair for advanced photomasks", Proc. SPIE 7748, Photomask and Next-Generation Lithography Mask Technology XVII, 77480G (25 May 2010); https://doi.org/10.1117/12.865197

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