Accuracy Of Electron-Optical Measurements Of Critical Dimensions

Edwin Trautman; Sheldon Moll; Leo Tometich

doi:10.1117/12.940421

17 April 1987 Accuracy Of Electron-Optical Measurements Of Critical Dimensions

Edwin Trautman, Sheldon Moll, Leo Tometich

Proceedings Volume 0775, Integrated Circuit Metrology, Inspection, & Process Control; (1987) https://doi.org/10.1117/12.940421
Event: Microlithography Conferences, 1987, Santa Clara, CA, United States

Abstract

The precision and accuracy of the measurement tool or process used to determine a critical dimension (CD) are clearly important when considering the operational significance of the result. The presumption in CD measurements is that a single result is sought to represent the particular CD of the structure being imaged. Since this dimension may vary over the image this result is appropriately the average of the dimension, which is estimated based on a series of measurements. We discuss the use of the "confidence interval" as a measure of the "goodness" of a CD measurement and use the AMRAY SEM 1500 to illustrate and test our methods on 1-1.5μm lines. The measurement performance of this scanning electron microscope is shown to be extremely good (3 "sigma" better than 0.01μm), and the 95% confidence interval is shown to be a reliable measure of the practical accuracy of the CD measurement.

Citation Download Citation

Edwin Trautman, Sheldon Moll, and Leo Tometich "Accuracy Of Electron-Optical Measurements Of Critical Dimensions", Proc. SPIE 0775, Integrated Circuit Metrology, Inspection, & Process Control, (17 April 1987); https://doi.org/10.1117/12.940421

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