Paper
15 September 2010 Conductive carbon nanotubes for semiconductor metrology
Victor Vartanian, Paul McClure, Vladimir Mancevski, Joseph J. Kopanski, Philp D. Rack, Ilona Sitnitsky, Matthew D. Bresin, Vince LaBella, Kathleen Dunn
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Abstract
This paper presents an evaluation of e-beam assisted deposition and welding of conductive carbon nanotube (c-CNT) tips for electrical scanning probe microscope measurements. Variations in CNT tip conductivity and contact resistance during fabrication were determined as a function of tip geometry using tunneling AFM (TUNA). Conductive CNT tips were used to measure 2D dopant concentration as a function of annealing conditions in BF2-implanted samples.
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Victor Vartanian, Paul McClure, Vladimir Mancevski, Joseph J. Kopanski, Philp D. Rack, Ilona Sitnitsky, Matthew D. Bresin, Vince LaBella, and Kathleen Dunn "Conductive carbon nanotubes for semiconductor metrology", Proc. SPIE 7767, Instrumentation, Metrology, and Standards for Nanomanufacturing IV, 77670F (15 September 2010); https://doi.org/10.1117/12.861315
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KEYWORDS
Resistance

Particle filters

Silicon

Etching

Metals

Metrology

Scanning probe microscopy

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