Paper
4 December 2010 Resolution capacity of Hall microsensors in MOS structures
George Căruntu, Cornel Panait, Irina Căruntu
Author Affiliations +
Proceedings Volume 7821, Advanced Topics in Optoelectronics, Microelectronics, and Nanotechnologies V; 78211Z (2010) https://doi.org/10.1117/12.882371
Event: Advanced Topics in Optoelectronics, Microelectronics, and Nanotechnologies, 2010, Constanta, Romania
Abstract
An essential parameter in the setting up of the performance of the measurement systems that uses Hall microsensors is the detection limit of such devices. The paper presents the results of research work regarding the analysis and optimization of magnetic microsensor structures realized in bipolar and MOS integrated circuits technology. On the basis of adequate models these have been established the noise main characteristics for double collector vertical magnetotransistor and for double-drain MOSFET magnetotransistors. By using the numerical simulation the values of the signal-to-noise ratio and the detection limits for the two analysed structured are compared and it is also emphasized the way in which choosing the geometry and the material features allow getting high-performance sensors.
© (2010) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
George Căruntu, Cornel Panait, and Irina Căruntu "Resolution capacity of Hall microsensors in MOS structures", Proc. SPIE 7821, Advanced Topics in Optoelectronics, Microelectronics, and Nanotechnologies V, 78211Z (4 December 2010); https://doi.org/10.1117/12.882371
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KEYWORDS
Signal to noise ratio

Field effect transistors

Molybdenum

Magnetism

Microsensors

Silicon

Interference (communication)

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