Development and characterization of carbon nanotube processes for NRAM technology

Gilles Amblard

doi:10.1117/12.879142

4 April 2011 Development and characterization of carbon nanotube processes for NRAM technology

Gilles Amblard

Author Affiliations +

Proceedings Volume 7970, Alternative Lithographic Technologies III; 797017 (2011) https://doi.org/10.1117/12.879142
Event: SPIE Advanced Lithography, 2011, San Jose, California, United States

Abstract

NRAM technology, a non-volatile memory based on the use of carbon nanotubes, overcomes the limitations of other memory technology types (including traditional Flash), for sub-40nm nodes, and is currently developed in manufacturing fabs. The NRAM technology process flow involves the deposition of a film of carbon nanotubes onto silicon wafers at several of the critical layers (using spin coating techniques). In this paper, we present the key steps of the development and characterization of carbon nanotube processes applied to NRAM technology, focusing on specific deposition techniques, thickness control, and defectivity.

Citation Download Citation

Gilles Amblard "Development and characterization of carbon nanotube processes for NRAM technology", Proc. SPIE 7970, Alternative Lithographic Technologies III, 797017 (4 April 2011); https://doi.org/10.1117/12.879142

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