Evaluation of a new model of mask topography effects

Christophe Pierrat

doi:10.1117/12.879230

22 March 2011 Evaluation of a new model of mask topography effects

Christophe Pierrat

Proceedings Volume 7973, Optical Microlithography XXIV; 797317 (2011) https://doi.org/10.1117/12.879230
Event: SPIE Advanced Lithography, 2011, San Jose, California, United States

Abstract

A new method capable of fast and accurate computation of mask topography effect was described and evaluated using a broad range of test structures. Results are presented for 1D and 2D test structures as well as for advanced OPC masks such as the one generated by inverse lithography or source-mask optimization software tools. The 1D test structures is a line and space test pattern with line width of 40nm, 60nm, 80nm, 100nm, 120nm the space width varying from 40nm to 1000nm. The RMS of the difference between the model and rigorous simulations is 3.6E-3 for 27,420 points correspond to all the combinations of line widths and space widths. The standard deviation of the CD difference between the model and the rigorous calculation, calculated for 5 thresholds (0.1, 0.11, 0.12, 0.13, and 0.14) and for all the structures, is 0.48nm. For a simple 2D test pattern, the mask fields are computed using rigorous calculation and compared to the model. The difference between the fields is within the error of the rigorous calculation. The resulting wafer images are almost identical with no re-scaling of the data was applied to either the mask fields or the wafer images. To study the applicability of the model to more complex patterns we have converted a contact level layout into an inverse mask and the new mask model was applied to the data in order to simulate the wafer image.

Citation Download Citation

Christophe Pierrat "Evaluation of a new model of mask topography effects", Proc. SPIE 7973, Optical Microlithography XXIV, 797317 (22 March 2011); https://doi.org/10.1117/12.879230

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available