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Tin sulfide (SnS) thin films were prepared by nano-multilayer method on glass substrate followed by thermal annealing
at 400 degrees for 3 hours in Argon atmosphere. The films showed strong (040) crystal orientation for the films with
stoichiometric ratio (Sn:S) of 1:1. The film had an optical energy band gap Eg=1.44 ev and a P-type conductivity with a
resistivity of 5 Ω•cm.
Zhan Xu,Yigang Chen,Weimin Shi, andLinjun Wang
"Oriented SnS thin films formed by nano-multilayer method", Proc. SPIE 7995, Seventh International Conference on Thin Film Physics and Applications, 799515 (18 February 2011); https://doi.org/10.1117/12.888219
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Zhan Xu, Yigang Chen, Weimin Shi, Linjun Wang, "Oriented SnS thin films formed by nano-multilayer method," Proc. SPIE 7995, Seventh International Conference on Thin Film Physics and Applications, 799515 (18 February 2011); https://doi.org/10.1117/12.888219