Measurement of the point spread function of a soft x-ray microscope by single pixel exposure of photoresists

Adam F. G. Leontowich; Tolek Tyliszczak; Adam P. Hitchcock

doi:10.1117/12.887553

18 May 2011 Measurement of the point spread function of a soft x-ray microscope by single pixel exposure of photoresists

Adam F. G. Leontowich, Tolek Tyliszczak, Adam P. Hitchcock

Author Affiliations +

Proceedings Volume 8077, Damage to VUV, EUV, and X-ray Optics III; 80770N (2011) https://doi.org/10.1117/12.887553
Event: SPIE Optics + Optoelectronics, 2011, Prague, Czech Republic

Abstract

The monochromatic zone plate focused soft X-rays of scanning transmission X-ray microscopes (STXM) can be used to directly write patterns in common photoresists, analogous to lithography with a focused electron or ion beam. A radiation damage spreading phenomenon when patterning with high doses was recently determined to be due to the point spread function of the optical system (Leontowich et al., Applied Physics A: Materials Science and Processing 103, 1 (2011)). We have used this phenomenon to measure the point spread function of three different STXMs by making a series of single pixel exposures in a photoresist at focus over a controlled dose range. Our results suggest this measurement is sensitive to zone plate aberrations; thus, it could be valuable feedback for optimizing zone plate fabrication schemes and STXM performance.

Citation Download Citation

Adam F. G. Leontowich, Tolek Tyliszczak, and Adam P. Hitchcock "Measurement of the point spread function of a soft x-ray microscope by single pixel exposure of photoresists", Proc. SPIE 8077, Damage to VUV, EUV, and X-ray Optics III, 80770N (18 May 2011); https://doi.org/10.1117/12.887553

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