Paper
23 May 2011 Reduced basis method for real-time inverse scatterometry
Author Affiliations +
Abstract
Optical metrology by scatterometry usually bases on the comparison of experimental and modeled light field data. When solving inverse scatterometric problems, often not only a single simulation has to be carried out, but multiple electromagnetic field solutions have to be computed for varying material and geometrical parameters of the system under consideration. Then, high computational times for a single forward solution can make the complete simulation task infeasible. Table based parameter reconstruction on the other hand has the disadvantage of long offline computational times for creation of the library. Also an increasing number of variable parameters can not be handled efficiently. In this contribution we introduce the reduced basis method for creation of highly accurate reduced order models of parametrized electromagnetic scattering problems. We apply our method to a real-world EUV metrology application and show speed up factors of about 3000 in reconstruction time. Instead of several minutes or hours EUV mask parameters can now be obtained in seconds, i.e., in real-time. Comparison to direct microscopical measurements of the reconstructed geometry demonstrate the good performance and maturity of our method.
© (2011) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Jan Pomplun, Sven Burger, Lin Zschiedrich, and Frank Schmidt "Reduced basis method for real-time inverse scatterometry", Proc. SPIE 8083, Modeling Aspects in Optical Metrology III, 808308 (23 May 2011); https://doi.org/10.1117/12.889892
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Cited by 3 scholarly publications.
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KEYWORDS
Scatterometry

Extreme ultraviolet

Error analysis

Data modeling

Diffraction

Chemical elements

Computer simulations

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