Plasma and optical thin film technologies

O. Stenzel; S. Wilbrandt; N. Kaiser; C. Schmitz; M. Turowski; D. Ristau; P. Awakowicz; R. P. Brinkmann; T. Musch; I. Rolfes; H. Steffen; R. Foest; A. Ohl; T. Köhler; G. Dolgonos; T. Frauenheim

doi:10.1117/12.895323

4 October 2011 Plasma and optical thin film technologies

O. Stenzel, S. Wilbrandt, N. Kaiser, C. Schmitz, M. Turowski, D. Ristau, P. Awakowicz, R. P. Brinkmann, T. Musch, I. Rolfes, H. Steffen, R. Foest, A. Ohl, T. Köhler, G. Dolgonos, T. Frauenheim

Author Affiliations +

Proceedings Volume 8168, Advances in Optical Thin Films IV; 81680L (2011) https://doi.org/10.1117/12.895323
Event: SPIE Optical Systems Design, 2011, Marseille, France

Abstract

The PluTO project is aimed at combining thin-film and plasma technologies. Accordingly, the consortium comprises experts in optical coating (Laser Zentrum Hannover, Fraunhofer IOF) and such in plasma technology (INP Greifswald, Ruhr University of Bochum RUB). The process plasmas available, especially the sheath layers, will be thoroughly characterized by means of special probes, so that the types, numbers and energies of the particles participating in the coating formation processes can be determined comprehensively in every detail for the first time. The data thus obtained will provide a basis for a numerical modelling of layer growth at atomic scale (Bremen Center for Computational Materials Science BCCMS). The results are expected to deepen the understanding of the physical mechanisms responsible for the influence of plasma action on the layer properties. In parallel, suitable tools for process monitoring will be identified and made available. Some first results have already been achieved which prove the viability of the approach.

Citation Download Citation

O. Stenzel, S. Wilbrandt, N. Kaiser, C. Schmitz, M. Turowski, D. Ristau, P. Awakowicz, R. P. Brinkmann, T. Musch, I. Rolfes, H. Steffen, R. Foest, A. Ohl, T. Köhler, G. Dolgonos, and T. Frauenheim "Plasma and optical thin film technologies", Proc. SPIE 8168, Advances in Optical Thin Films IV, 81680L (4 October 2011); https://doi.org/10.1117/12.895323

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