Design, synthesis, and characterization of KrF negative developable bottom anti-reflective coating materials

Sen Liu; Kuang-Jung Chen; Wu-Song Huang; Steven Holmes; Karen Huang; Nicolette Fender; Ranee Kwong; Brian Osborn; Cherry Tang; Chung-Hsi Wu; Mark Slezak

doi:10.1117/12.916158

19 March 2012 Design, synthesis, and characterization of KrF negative developable bottom anti-reflective coating materials

Sen Liu, Kuang-Jung Chen, Wu-Song Huang, Steven Holmes, Karen Huang, Nicolette Fender, Ranee Kwong, Brian Osborn, Cherry Tang, Chung-Hsi Wu, Mark Slezak

Author Affiliations +

Proceedings Volume 8325, Advances in Resist Materials and Processing Technology XXIX; 83251B (2012) https://doi.org/10.1117/12.916158
Event: SPIE Advanced Lithography, 2012, San Jose, California, United States

Abstract

Negative photoresist materials for 248 nm (KrF excimer laser) implant applications are of interest to research and development recently, due to the ever-present demand to shrink lithographically-patterned device dimensions at an affordable cost. Challenges to developing such a successful resist are the topography of the substrate and subsequent reflectivity complexities. Substrate reflectivity control, resist profile, and critical dimension (CD) uniformity are critical issues that must be addressed to enable robust lithography performance at high KrF numerical aperture. The design, synthesis and characterization of a series of polymers for negative developable bottom anti-reflective coating (NDBARC) materials suitable for KrF negative implant resists is described.

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Sen Liu, Kuang-Jung Chen, Wu-Song Huang, Steven Holmes, Karen Huang, Nicolette Fender, Ranee Kwong, Brian Osborn, Cherry Tang, Chung-Hsi Wu, and Mark Slezak "Design, synthesis, and characterization of KrF negative developable bottom anti-reflective coating materials", Proc. SPIE 8325, Advances in Resist Materials and Processing Technology XXIX, 83251B (19 March 2012); https://doi.org/10.1117/12.916158

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