Organic Vapor Phase Deposition (OVPD) for efficient OLED manufacturing: the specific advantages and possibilities of carrier-gas enhanced vapor phase deposition for the manufacturing of organic thin film devices

Juergen Kreis; Markus Schwambera; Dietmar Keiper; Markus Gersdorff; Michael Long; Michael Heuken

doi:10.1117/12.930502

13 September 2012 Organic Vapor Phase Deposition (OVPD) for efficient OLED manufacturing: the specific advantages and possibilities of carrier-gas enhanced vapor phase deposition for the manufacturing of organic thin film devices

Juergen Kreis, Markus Schwambera, Dietmar Keiper, Markus Gersdorff, Michael Long, Michael Heuken

Author Affiliations +

Proceedings Volume 8476, Organic Light Emitting Materials and Devices XVI; 84761L (2012) https://doi.org/10.1117/12.930502
Event: SPIE Organic Photonics + Electronics, 2012, San Diego, California, United States

Abstract

Being introduced more than 20 years ago, OLEDs have seen a strong push in particular in the last two years, mostly driven by key players in the flat panel display industry. The majority of OLEDs manufactured today are deposited by vacuum thermal evaporation (VTE). Whilst this approach enables the making of high-performance devices scaling up of this approach has met new challenges when substrate dimensions are exceeding the "proof-of-principle" dimensions of pilot lines. Total production costs are increasingly moving into the focus of consideration. With Organic Vapor Phase Deposition (OVPD), AIXTRON has commercialized the principle of utilizing inert carriergas for the transport and controlled condensation of small molecules. While the original concept had been proposed by Prof. Steven Forrest at Princeton University, AIXTRON added its expertise in scaling gas phase processes to make this technology applicable for high-throughput production. Combining the basic concept of OVPD with AIXTRON's comprehensive expertise in utilizing close coupled showerheads and the underlying scaling rules, the disruptive approach offers a number of significant advantages: 1) decoupling of evaporation source and deposition system: additional freedom and independent optimization of source design and deposition area; 2) Utilization of carrier-gas for a more efficient evaporation, potentially increasing process windows; 3) Close-coupled showerhead approach realizes high material utilization with homogeneity; 4) Control of deposition rates by carrier-gas flow instead of the evaporation temperature enables precise rates control, co-deposition of various materials at changing rates. This paper will discuss the most significant differences compared to VTE and explain how the approach addresses requirements for efficient scaling as well as enabling advanced structure designs.

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Juergen Kreis, Markus Schwambera, Dietmar Keiper, Markus Gersdorff, Michael Long, and Michael Heuken "Organic Vapor Phase Deposition (OVPD) for efficient OLED manufacturing: the specific advantages and possibilities of carrier-gas enhanced vapor phase deposition for the manufacturing of organic thin film devices", Proc. SPIE 8476, Organic Light Emitting Materials and Devices XVI, 84761L (13 September 2012); https://doi.org/10.1117/12.930502

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