Double-pulse irradiation of ultrafast laser for high-efficiency glass microwelding

Koji Sugioka; Sizhu Wu; Katsumi Midorikawa

doi:10.1117/12.2003469

13 March 2013 Double-pulse irradiation of ultrafast laser for high-efficiency glass microwelding

Koji Sugioka, Sizhu Wu, Katsumi Midorikawa

Proceedings Volume 8607, Laser Applications in Microelectronic and Optoelectronic Manufacturing (LAMOM) XVIII; 86070G (2013) https://doi.org/10.1117/12.2003469
Event: SPIE LASE, 2013, San Francisco, California, United States

Abstract

Efficient microwelding of glass substrates by irradiation using a double-pulse train of ultrafast laser pulses is demonstrated. The bonding strength of two photosensitive glass substrates welded by double-pulse irradiation was evaluated to be 13.36 MPa, which is approximately 27% greater than that of a sample prepared by conventional irradiation by a single-pulse train. Such an improvement is responsible for individual control of each electron excitation process, i.e., multiphoton ionization or tunneling ionization by the 1st pulse followed by electron heating or avalanche ionization by 2nd pulse. This paper performs characterization of samples prepared by the double-pulse irradiation and then discusses the detailed mechanism for efficient welding.

Citation Download Citation

Koji Sugioka, Sizhu Wu, and Katsumi Midorikawa "Double-pulse irradiation of ultrafast laser for high-efficiency glass microwelding", Proc. SPIE 8607, Laser Applications in Microelectronic and Optoelectronic Manufacturing (LAMOM) XVIII, 86070G (13 March 2013); https://doi.org/10.1117/12.2003469

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