MAPPER: progress toward a high-volume manufacturing system

G. de Boer; M. P. Dansberg; R. Jager; J. J. M. Peijster; E. Slot; S. W. H. K. Steenbrink; M. J. Wieland

doi:10.1117/12.2011486

26 March 2013 MAPPER: progress toward a high-volume manufacturing system

G. de Boer, M. P. Dansberg, R. Jager, J. J. M. Peijster, E. Slot, S. W. H. K. Steenbrink, M. J. Wieland

Proceedings Volume 8680, Alternative Lithographic Technologies V; 86800O (2013) https://doi.org/10.1117/12.2011486
Event: SPIE Advanced Lithography, 2013, San Jose, California, United States

Abstract

MAPPER Lithography is developing a maskless lithography technology based on massively-parallel electron-beam writing with high speed optical data transport for switching the electron beams. In this way optical columns can be made with a throughput of 10 wafers per hour. By clustering several of these systems together high throughputs can be realized in a small footprint. This enables a highly cost-competitive solution for either direct patterning or complementary patterning approach, [1, 2]. For a 10 wph throughput per unit MAPPER will use 13,260 parallel electron beams, delivering 170 μA to the wafer. To realize this large current at the wafer MAPPER uses its patterned beam approach where each beam consists of 49 subbeams [3]. MAPPER is currently realizing its MATRIX platform. This system is one unit in the cluster depicted above and will have a capability of 10 wph (containing the patterned beams approach) and have full overlay capability. One 10 wph unit will have a footprint of 1.1 m x 1.65m. This paper will provide an overview of the development status of this MATRIX platform.

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G. de Boer, M. P. Dansberg, R. Jager, J. J. M. Peijster, E. Slot, S. W. H. K. Steenbrink, and M. J. Wieland "MAPPER: progress toward a high-volume manufacturing system", Proc. SPIE 8680, Alternative Lithographic Technologies V, 86800O (26 March 2013); https://doi.org/10.1117/12.2011486

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