Polarization-insensitive silicon immersion grating for telecom applications

Yuichi Higuchi; Yuzo Ishii; Koichi Hadama; Joji Yamaguchi; Tsuyoshi Yamamoto

doi:10.1117/12.2037137

8 March 2014 Polarization-insensitive silicon immersion grating for telecom applications

Yuichi Higuchi, Yuzo Ishii, Koichi Hadama, Joji Yamaguchi, Tsuyoshi Yamamoto

Proceedings Volume 8988, Integrated Optics: Devices, Materials, and Technologies XVIII; 89880G (2014) https://doi.org/10.1117/12.2037137
Event: SPIE OPTO, 2014, San Francisco, California, United States

Abstract

We describe an immersion grating (IG) with both low polarization-dependent loss (PDL) and high diffraction efficiency. Our immersion grating consists of a silicon (Si) prism and a Si grating coated with dielectric film. We analyze the effect of the refractive index of dielectric film and clarify the refractive index ratio between a Si grating and dielectric film. Selecting an adequate material for the dielectric film, we design the diffraction efficiency of TM polarization without changing that of TE polarization. The simulation results for the optimized IG show a PDL of 0.2 dB and diffraction efficiency of -0.4 dB. A prototype with high dispersion power provides a low PDL of 0.6 dB, while maintaining a high diffraction efficiency of -0.4 dB.

Citation Download Citation

Yuichi Higuchi, Yuzo Ishii, Koichi Hadama, Joji Yamaguchi, and Tsuyoshi Yamamoto "Polarization-insensitive silicon immersion grating for telecom applications", Proc. SPIE 8988, Integrated Optics: Devices, Materials, and Technologies XVIII, 89880G (8 March 2014); https://doi.org/10.1117/12.2037137

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