Improvements in bandwidth and wavelength control for XLR 660xi systems

Will Conley; Hoang Dao; David Dunlap; Ronnie P. Flores; Matt Lake; Kevin O'Brien; Alicia Russin; Aleks Simic; Josh Thornes; Brian Wehrung; John Wyman

doi:10.1117/12.2048305

31 March 2014 Improvements in bandwidth and wavelength control for XLR 660xi systems

Will Conley, Hoang Dao, David Dunlap, Ronnie P. Flores, Matt Lake, Kevin O'Brien, Alicia Russin, Aleks Simic, Josh Thornes, Brian Wehrung, John Wyman

Author Affiliations +

Proceedings Volume 9052, Optical Microlithography XXVII; 90521H (2014) https://doi.org/10.1117/12.2048305
Event: SPIE Advanced Lithography, 2014, San Jose, California, United States

Abstract

As chipmakers continue to reduce feature sizes and shrink CDs on the wafer to meet customer needs, Cymer continues developing light sources that enable advanced lithography, and introducing innovations to improve productivity, wafer yield, and cost of ownership. In particular, the architecture provides dose control and improved spectral bandwidth stability, both of which enables superior CD control and wafer yield for the chipmaker. The XLR 660ix incorporates new controller technology called ETC for improvements in spectral bandwidth stability, energy dose stability, and wavelength stability. This translates to improved CD control and higher wafer yields. The authors will discuss the impact that these improvements will have in advanced lithography applications.

Citation Download Citation

Will Conley, Hoang Dao, David Dunlap, Ronnie P. Flores, Matt Lake, Kevin O'Brien, Alicia Russin, Aleks Simic, Josh Thornes, Brian Wehrung, and John Wyman "Improvements in bandwidth and wavelength control for XLR 660xi systems", Proc. SPIE 9052, Optical Microlithography XXVII, 90521H (31 March 2014); https://doi.org/10.1117/12.2048305

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