Paper
1 May 2014 Measurement comparison of goniometric scatterometry and coherent Fourier scatterometry
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Abstract
Scatterometry is a common tool for the dimensional characterization of periodic nanostructures. In this paper we compare measurement results of two different scatterometric methods: a goniometric DUV scatterometer and a coherent scanning Fourier scatterometer. We present a comparison between these two methods by analyzing the measurement results on a silicon wafer with 1D gratings having periods between 300 nm and 600 nm. The measurements have been performed with PTB’s goniometric DUV scatterometer and the coherent scanning Fourier scatterometer at TU Delft. Moreover for the parameter reconstruction of the goniometric measurement data, we apply a maximum likelihood estimation, which provides the statistical error model parameters directly from measurement data.
© (2014) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
J. Endres, N. Kumar, P. Petrik, M. -A. Henn, S. Heidenreich, S. F. Pereira, H. P. Urbach, and B. Bodermann "Measurement comparison of goniometric scatterometry and coherent Fourier scatterometry", Proc. SPIE 9132, Optical Micro- and Nanometrology V, 913208 (1 May 2014); https://doi.org/10.1117/12.2052819
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Cited by 3 scholarly publications.
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KEYWORDS
Scatterometry

Deep ultraviolet

Diffraction

Oxides

Silicon

Scatter measurement

Polarization

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