Paper
2 June 2014 Stack of PECVD silicon nitride nano-films on optical fiber end-face for refractive index sensing
Mateusz Śmietana, Marcin Koba, Radoslaw Różycki-Bakon
Author Affiliations +
Proceedings Volume 9157, 23rd International Conference on Optical Fibre Sensors; 91575F (2014) https://doi.org/10.1117/12.2059770
Event: OFS2014 23rd International Conference on Optical Fiber Sensors, 2014, Santander, Spain
Abstract
This paper presents a stack of silicon nitride (SiNx) nano-films deposited with radio-frequency plasma-enhanced chemical deposition (RF PECVD) method on single-mode fiber end-face for refractive index (RI) sensing. The stack consist of high (n~2.4) and low (n~1.9) refractive index (at λ=1550 nm) SiNx nano-films arranged alternately. As a result of the experiment where 5 nano-layers were deposited, we received down to -30 dB-deep resonance in reflection spectrum at about λ=1550 nm. In the proposed sensing scheme both reflected power and wavelength of the resonance can be used for external RI measurements.
© (2014) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Mateusz Śmietana, Marcin Koba, and Radoslaw Różycki-Bakon "Stack of PECVD silicon nitride nano-films on optical fiber end-face for refractive index sensing", Proc. SPIE 9157, 23rd International Conference on Optical Fibre Sensors, 91575F (2 June 2014); https://doi.org/10.1117/12.2059770
Lens.org Logo
CITATIONS
Cited by 4 scholarly publications.
Advertisement
Advertisement
RIGHTS & PERMISSIONS
Get copyright permission  Get copyright permission on Copyright Marketplace
KEYWORDS
Plasma enhanced chemical vapor deposition

Refractive index

Silicon

Optical fibers

Sensors

Neodymium

Optical properties

Back to Top