Optical characterization of CMOS compatible micro optics fabricated by mask-based and mask-less hybrid lithography

Sunglin Wang; Chris Summitt; Lee Johnson; Melissa Zaverton; Tom Milster; Yuzuru Takashima

doi:10.1117/12.2062414

15 September 2014 Optical characterization of CMOS compatible micro optics fabricated by mask-based and mask-less hybrid lithography

Sunglin Wang, Chris Summitt, Lee Johnson, Melissa Zaverton, Tom Milster, Yuzuru Takashima

Author Affiliations +

Proceedings Volume 9170, Nanoengineering: Fabrication, Properties, Optics, and Devices XI; 91700F (2014) https://doi.org/10.1117/12.2062414
Event: SPIE NanoScience + Engineering, 2014, San Diego, California, United States

Abstract

We report a CMOS compatible fabrication and optical characterization of the micrometer scale optical coupler, a 45° mirror-based optical coupler for inter-layer optical coupling. A newly proposed mask-based and mask-less hybrid lithography process enables accurate surface profile of the micrometer sized 45° mirror by using a CMOS compatible buffer coat material. Surface profile inspected by an optical interferometry agrees well with SEM based inspection results. Experimental and theoretical results for routing and coupling of laser beam in 90° will be discussed.

Citation Download Citation

Sunglin Wang, Chris Summitt, Lee Johnson, Melissa Zaverton, Tom Milster, and Yuzuru Takashima "Optical characterization of CMOS compatible micro optics fabricated by mask-based and mask-less hybrid lithography", Proc. SPIE 9170, Nanoengineering: Fabrication, Properties, Optics, and Devices XI, 91700F (15 September 2014); https://doi.org/10.1117/12.2062414

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